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Dual chamber in-air and chemical vapour glow discharge system suitable for surface modification of TEM grids.
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Key Features
- Short in-air cycle time
- Second chamber for separating in-air and in-vapour processes
- No cross-contamination between chambers due to post-process flush cycle
- Automatic vapour delivery ensures reliable and reproducible results
- Purge cycles reduce water vapour and oxygen concentrations, ensuring excellent yield of specifically orientated macromolecules
- Adjustable slow vent time to minimize sample disturbance
- Optional fast vent for rapid process times
- Safe handling of reagent
- Three level adjustable height sample stage ensures repeatable results
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